@article{2005-odwyer-oesterschulze-j-phy-con-ser-v119-p109, Abstract = {We report the results of a study into the quality of functionalized surfaces for nanolithographic imaging. Self-assembled monolayer (SAM) coverage, subsequent post-etch pattern definition and minimum feature size all depend on the quality of the Au substrate used in atomic nanolithographic experiments. We find sputtered Au substrates yield much smoother surfaces and a higher density of {111} oriented grains than evaporated Au surfaces. A detailed study of the self-assembly mechanism using molecular resolution AFM and STM has shown that the monolayer is composed of domains with sizes typically of 5-25 nm, and multiple molecular domains can exist within one Au grain. Exposure of the SAM to an optically-cooled atomic Cs beam traversing a two-dimensional array of submicron material masks ans also standing wave optical masks allowed determination of the minimum average Cs dose (2 Cs atoms per SAM molecule) and the realization of}, Author = {O'Dwyer, C. AND Gay, G. AND Lesegno, B. d. AND Weiner, J. AND Mützel, M. AND Haubrich, D. AND Meschede, D. AND Ludolph, K. AND Georgiev, G. AND Oesterschulze, E.}, Journal = {J. Phys.: Conference Series}, Pages = {109}, Title = {{Advancing atomic nanolithography: cold atomic Cs beam exposure of alkanethiol self-assembled monolayers}}, Volume = {119}, Year = {2005} }